s-ALD Spatial Atomic Layer Deposition

Smit Ovens developed a ALD platform  for rigid substrates. Working with a team of experts we are able to adres all kind of applications. Our team of experts would like to investigate your layer specification. 

Addressing multiple application areas:

This ground breaking s-ALD technique opens up possibilities in many application areas like photovoltaics, OLEDs, displays, glazing, energy storage, sensors, optics etc., with opportunities for:

  • Interface engineering (e.g. CIGS)
  • Transparent conductors (e.g. for solar cells)
  • Light management (e.g. for displays, solar cells and OLEDs)
  • Encapsulation & barriers (e.g. for OLEDs/OPV)
  • Packaging
  • Dielectric- and passivation layers (e.g. for TFTs)
  • Oxide semiconductors (e.g. for TFTs)
  • Hybrid or organic films by Molecular Layer Deposition
  • Optical coatings

 

  • Semiconductors and Displays
    • Gate stacks
    • Capacitors
    • Oxide based thin film transistors
      • ZnO
      • Al2O3
    • (Touch)screens anti-reflection layers
      • SiO2 and TiO2
  • Photovoltaics
    • Surface passivation layers in c-Si (Al2O3)
    • Buffer layers for CI(G)S solar cells  as alternative for CBD of CdS
      • Zn(O,S) and many more
    • Encapsulation of CIGS and OPV solar cells
      • Al2O3
    • CdTe window layer
      • Zn(O,S)
    • Light management including AR stacks
    • Absorbers
      • Ga-Al-As
      • Cu-In-S
    • TCOs
      • Doped-ZnO
    • Barrier layers for dye-sensitized solar cells
    • ALD for nanostructured solar cells
  • Organic Electronics
    • Moisture diffusion barriers and thin film encapsulation
    • Al2O3
  • Architectural glazing Self-cleaning layers using TiO2
    • Anti-reflection
      • Multilayer oxides (TiO2, SiO2)
    • Low-E
      • Stacks with Ag and oxides
  • Antimicrobial Ag