s-ALD Spatial Atomic Layer Deposition
Smit Ovens developed a ALD platform for rigid substrates. Working with a team of experts we are able to adres all kind of applications. Our team of experts would like to investigate your layer specification.
Addressing multiple application areas:
This ground breaking s-ALD technique opens up possibilities in many application areas like photovoltaics, OLEDs, displays, glazing, energy storage, sensors, optics etc., with opportunities for:
- Interface engineering (e.g. CIGS)
- Transparent conductors (e.g. for solar cells)
- Light management (e.g. for displays, solar cells and OLEDs)
- Encapsulation & barriers (e.g. for OLEDs/OPV)
- Packaging
- Dielectric- and passivation layers (e.g. for TFTs)
- Oxide semiconductors (e.g. for TFTs)
- Hybrid or organic films by Molecular Layer Deposition
- Optical coatings
- Semiconductors and Displays
- Gate stacks
- Capacitors
- Oxide based thin film transistors
- ZnO
- Al2O3
- (Touch)screens anti-reflection layers
- SiO2 and TiO2
- Photovoltaics
- Surface passivation layers in c-Si (Al2O3)
- Buffer layers for CI(G)S solar cells as alternative for CBD of CdS
- Zn(O,S) and many more
- Encapsulation of CIGS and OPV solar cells
- Al2O3
- CdTe window layer
- Zn(O,S)
- Light management including AR stacks
- Absorbers
- Ga-Al-As
- Cu-In-S
- TCOs
- Doped-ZnO
- Barrier layers for dye-sensitized solar cells
- ALD for nanostructured solar cells
- Organic Electronics
- Moisture diffusion barriers and thin film encapsulation
- Al2O3
- Architectural glazing Self-cleaning layers using TiO2
- Anti-reflection
- Multilayer oxides (TiO2, SiO2)
- Low-E
- Stacks with Ag and oxides
- Antimicrobial Ag