Pre heater System
Our pre-heater provides rapid heating of large substrates before they enter the process chamber. You can use the pre-heater to give your substrate any initial temperature profile you want, allowing you to compensate for the actual cooling fingerprint of your reaction chamber for a uniformly high-quality end product.
Available as an auxiliary product for deposition systems (including atmospheric-pressure, vacuum and sputtering), it lets you make best use of your available floor space.
Features / benefits
|Product feature||Benefit for you|
|Accurate temperature control with extremely uniform temperature distribution||Less thermal stress for fewer breakages|
|High performance||Smaller system for better use of floor space and lower upfront investment|
|Energy-saving design||Lower operating costs|
|Highly responsive temperature controls||Improved end-product efficiency|
|Rapid return to production conditions after stoppages||Improved production efficiency with no "first panel effect"|