Pre heater System

Our pre-heater provides rapid heating of large substrates before they enter the process chamber. You can use the pre-heater to give your substrate any initial temperature profile you want, allowing you to compensate for the actual cooling fingerprint of your reaction chamber for a uniformly high-quality end product.

Available as an auxiliary product for deposition systems (including atmospheric-pressure, vacuum and sputtering), it lets you make best use of your available floor space.

Features / benefits

Product feature Benefit for you
Accurate temperature control with extremely uniform temperature distribution Less thermal stress for fewer breakages
High performance Smaller system for better use of floor space and lower upfront investment
Energy-saving design Lower operating costs
Highly responsive temperature controls Improved end-product efficiency
Rapid return to production conditions after stoppages Improved production efficiency with no "first panel effect"